ISO 23170:2022
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ISO 23170:2022
74814

Abstract

 Preview

This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).


General information 

  •  :  Published
     : 2022-06
  •  : 1
     : 29
  •  : ISO/TC 201/SC 4 Depth profiling
  •  :
    71.040.40 Chemical analysis

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