This document provides guidelines for measuring the sputtered depth in sputtered depth profiling.
The methods of sputtered depth measurement described in this document are applicable to techniques of surface chemical analysis when used in combination with ion bombardment for the removal of a part of a solid sample to a typical sputtered depth of up to several micrometres. The depth typically determined by this approach is between 1 nm to 500 µm.
Status: PublishedPublication date: 2021-03
Edition: 2Number of pages: 13
Technical Committee: ISO/TC 201/SC 4 Depth profiling
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