Reference number
ISO/TR 22335:2007
Technical Report
ISO/TR 22335:2007
Surface chemical analysis — Depth profiling — Measurement of sputtering rate: mesh-replica method using a mechanical stylus profilometer
Edition 1
2007-07
Technical Report
Preview
ISO/TR 22335:2007
36187
недоступно на русском языке
Опубликовано (Версия 1, 2007)
Последний раз этот публикация был пересмотрен в  2020. Поэтому данная версия остается актуальной.

ISO/TR 22335:2007

ISO/TR 22335:2007
36187
Язык
Формат
CHF 96
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Тезис

ISO/TR 22335:2007 describes a method for determining ion-sputtering rates for depth profiling measurements with Auger electron spectroscopy (AES) and X‑ray photoelectron spectroscopy (XPS) where the specimen is ion-sputtered over a region with an area between 0,4 mm2 and 3,0 mm2. The Technical Report is applicable only to a laterally homogeneous bulk or single-layered material where the ion-sputtering rate is determined from the sputtered depth, as measured by a mechanical stylus profilometer, and sputtering time.

The Technical Report provides a method to convert the ion-sputtering time scale to sputtered depth in a depth profile by assuming a constant sputtering velocity. This method has not been designed for, or tested using, a scanning probe microscope system. It is not applicable to the case where the sputtered area is less than 0,4 mm2 or where the sputter-induced surface roughness is significant compared with the sputtered depth to be measured.

Общая информация

  •  : Опубликовано
     : 2007-07
    : Подтверждение действия международного стандарта [90.93]
  •  : 1
  • ISO/TC 201/SC 4
    71.040.40 
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